Wang M. Lithography

Статья

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размер 83.03 МБ
добавлен 07 декабря 2011 г.

InTech, 2010. - 656 pages. Michael Wang, Editor. ISBN 978-953-307-064-3.
Сборник статей по новейшим методам литографии. Рассматриваемые темы включают ионно- и электроннолучевую литографию, лазерную литографию, иммерсионную фотолитографию, литографию в дальней ультрафиолетовой области спектра, наноимпринтную литографию, методы коррекции эффекта близости, изготовление проекционных объективов сверхвысокого разрешения, новейшие достижения в технологии фоторезистов, и др.

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