Химия и химическая промышленность
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Pierson, H.O. Handbook of Chemical Vapor Deposition: Principles, Technologies and Applications
2nd ed. - Noyes Publications, 1999. 506 pp. Second Edition

Chemical vapor deposition (CVD) has grown very rapidly in the last twenty years and applications of this fabrication process are now key elements in many industrial products, such as semiconductors, optoelectronics, optics, cutting tools, refractory fibers, filters and many others. CVD is no longer a laboratory curiosity but a major technology on par with other major technological disciplines such as electrodeposition, powder metallurgy, or conventional ceramic processing.
Several books have recently been published on the subject of CVD, each dealing with a specific aspect of the technology, such as CVD for microelectronics or metallo-organic CVD. With many of his colleagues, the author has felt the need for a general, systematic, objective, and balanced review solely devoted to CVD, which would cover all its scientific, engineering, and applications aspects, coordinate the divergent trends found today in the CVD business, promote interaction and sharpen the focus of research and development.
To fill this need is the purpose of this book, which should be useful to students, scientists, and engineers, as well as production and marketing managers and suppliers of materials, equipment and services.
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