Roth J.R. Industrial Plasma Engineering. Volume 2: Applications to Nonthermal Plasma Processing

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размер 4.73 МБ
добавлен 13 марта 2011 г.

IOP, Institute of Physics Publishing, Bristol and Philadelphia, 2001, 645 c.
Второй том книги о плазменных технологиях. Содержит разделы:
Surface Interactions in Plasma Processing
Atmospheric Pressure Plasma Sources
Vacuum Plasma Sources
Plasma Reactors for Plasma Processing
Specialized Techniques and Devices for Plasma Processing
Parametric Plasma Effects On Plasma Processing
Diagnostics for Plasma Processing
Plasma Treatment of Surfaces
SurfaceModification by Implantation and Diffusion
Thin-Film Deposition by Evaporative Condensation and Sputtering
Plasma Chemical Vapor Deposition (PCVD)
Plasma Etching

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