• формат djvu
  • размер 7.17 МБ
  • добавлен 17 декабря 2011 г.
Chang C.Y., Sze S.M. ULSI Technology
The McGraw-Hill Companies, 1996, 726 Pages.

This text follows the tradition of Sze's highly successful pioneering text on VLSI technology and is updated with the latest advances in the field of microelectronic chip fabrication. Since computer chips are foundations of mode electronics, these topics are essential for the next generation of USLI technologies, allowing more transistors to be packaged on a single chip. Contributing to each chapter are industry experts, specializing in topics such as epitaxy with low temperature process, rapid thermal processes, low damage plasma reactive ion etching, fine line litography, cleaning technology, clean room technology, packing and reliability.

Cleanroom Technology.
Wafer-Cleaning Technology.
Conventional and Rapid Thermal Processes.
Dielectric and Polysilicon Film Deposition.
Process Integration.
Assembly and Packaging.
Wafer Fab Manufacturing Technology.
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