Chen F. Principles of plasma processing

2 ed. Springer, 2006. 421 p. ISBN:0306413329 This complete introduction to plasma physics and controlled fusion by one of the pioneering scientists in this expanding field offers both a simple and intuitive discussion of the basic concepts of this subject and an insight into the challenging problems of current research. In a wholly lucid manner the work covers single-particle motions, fluid equations for plasmas, wave motions, diffusion and res...

Wiley-VCH, Weinheim, 2008, 457 pages A panel of internationally renowned scientists discuss the latest results in plasma technology. This volume has been compiled with both a didactic approach and an overview of the newest achievements for industrial applications. It is divided into two main sections. One is focused on fundamental technology, including plasma production and control, high-pressure discharges, modeling and simulation, diagnostics...

Pergamon Press, 2000 937 pages Principles: Energy Sources. Nuclear Reactions and Coulomb Collisions. Atomic Collisions and Radiation. Fusion Reactor Power Balance. Plasma Fundamentals. Gas Discharges and Breakdown. Charged Particles Trajectories. Plasma Confinement. Plasma Heating. Plasma Diagnostics. Experiments: Mirrors and Cusps. Pinches and Compact Toroids. Tokamaks. Other Toroidal Devices. Inertial Confinement Fusion (ICF). ICF Drivers and...

Springer, 2011. 284 p. ISBN: 1849964106 Frontiers in Fusion Research provides a systematic overview of the latest physical principles of fusion and plasma confinement. It is primarily devoted to the principle of magnetic plasma confinement, that has been systematized through 50 years of fusion research. Frontiers in Fusion Research begins with an introduction to the study of plasma, discussing the astronomical birth of hydrogen energy and the b...

John Wiley & Sons, Inc. , 1994, 572 p. Preface Symbols And Abbreviations Physical Constants And Conversion Factors Practical Formulae Introduction Basic Plasma Equations And Equilibrium Atomic Collisions Plasma Dynamics Diffusion And Transport DC Sheaths Chemical Reactions And Equilibrium Molecular Collisions Chemical Kinetics And Surface Processes Particle And Energy Balance In Discharges Capacitive Discharges Inductive Disch...

John Wiley & Sons, Inc. , 2-ed, 2005, 757 p. Preface Preface To The First Edition Symbols And Abbreviations Physical Constants And Conversion Factors Practical Formulae Introduction Basic Plasma Equations And Equilibrium Atomic Collisions Plasma Dynamics Diffusion And Transport Direct Current (DC) Sheaths Chemical Reactions And Equilibrium Molecular Collisions Chemical Kinetics And Surface Processes Particle And Energy Balance In Disch...

Taylor & Francis, CRC Press, 2006, Pages: 330 Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition, etching, and even process monitoring and diagn...

Noyes publications, Park Ridge, New Jersey, U.S.A. 1990, 536 стр. Рассматриваются физические основы ряда газовых разрядов, используемых в плазменных технологиях для травления и осаждения различных покрытий. Книга имеет следующие разделы. Techniques for ic processing. Introduction to plasma concepts and discharge configurations. Fundamentals of sputtering and reflection. Bombardment-Induced compositional change with alloys, Oxides, Oxysalts, And h...

IOP, Institute of Physics Publishing, Bristol and Philadelphia, 2001, 645 c. Второй том книги о плазменных технологиях. Содержит разделы: Surface Interactions in Plasma Processing Atmospheric Pressure Plasma Sources Vacuum Plasma Sources Plasma Reactors for Plasma Processing Specialized Techniques and Devices for Plasma Processing Parametric Plasma Effects On Plasma Processing Diagnostics for Plasma Processing Plasma Treatment of Surfaces Surface...

Cambridge International Science Publishi, 2001. 520 p. ISBN:1898326231 The book contains the results of investigations of electro-physical, chemical, gas-dynamic and other processes in low-temperature plasma and their diagnostics. Both conventional spectral and optical methods of diagnostics and new and laser methods are examined, together with electrostatic probes for investigating rarefied and dense plasma, especially in the presence of chemi...