example, cell adhesion to surfaces can be either promoted by immobilizing cell
adhesive peptides, such as RGD [3] and IKVAV [4], and proteins, such as
fibronectin [5] and laminin [6], or prohibited by attaching macromolecules such
as poly(ethyle ne glycol) [7]. Besides surface chemistry, surface morphology is of
paramount importance in determining the biological responses to biomaterials.
It is well known that cell orientation and the direction of cell movement are
affected by the morphology of the substrate, a phenomenon known as ‘‘contact
guidance.’’ The ability to control cell orientation and connection is especially
important for tissue engineering applications, as an intricate network of cells
and extracellular matrix proteins modulates tissue functions. The advent of
lithographic methods as used in microelectronics for making structures on the
same scale as biological cells has opened up the possibility of precise surface
engineering of biomaterials down to the nanometer scale [8].
The focus of this chapter will be placed on using ion beam lithography/ion
implantation to enhance performances of both ‘‘soft’’ polymeric biomaterials
and ‘‘hard’’ metallic biomaterials. Throughout this chapter, we will use specific
examples for applications such as hard tissue replacements, blood contacting
implants, and other products. A brief summary on the recent developments of
novel biocompatible photoresists, aiming at improving the compatibility of the
conventional photolithography with biomolecular (i.e., attachment of cell-
specific peptides and proteins) and cellular patterning, is also included.
2.2 OVERVIEW OF ION IMPLANTATION PROCESS
Ion implantation refers to the bombardment of material surfaces with ions with
a minimum exposure of 1020 keV of energy [9]. It is a process whereby
energetic dopant ions are made to impinge on silicon or other targets, resulting
in the penetration of these ions below the target surface and thereby giving rise
to controlled, predictable dopant distributions. Due to high initial energy, ions
penetrate the surface layer of the material losing their energy in two types of
interactions: elastic collisions with target nuclei and inelastic collisions with the
electrons [10]. Because the ions do not penetrate too deeply, usually less than a
micrometer, the implantation and modifications are confined to the near-
surface region, and only surfa ce properties are changed.
Ion implantation offers numerous advantages for treating component
surfaces. A primary benefit is the ability to selectively modify the surface
without detrimentally affecting mate rial’s bulk propert ies, largely because the
process is carried out at low substrate temperature. It is useful for generating
surface layers that are integrated with the substrate and have a specified
composition, thus avoiding the risk of delamination associated with techniques
such as coating. The process is extremely controllable and reproducible, and
offers high concentration of the dopants. It can be tailored to modify different
surfaces in desired ways. The technique is high ly versatile, allow ing selection of
the types of ions used according to the characteristics to be mo dified. When
used in combination with an electroformed screen mesh mask, it can transfer
26 BIOMEDICAL NANOSTRUCTURES