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288 Principles of Radiation Interaction in Matter and Detection
called displacement damage. Defects, induced by the interaction of radiation with
semiconductors, are primary point-defects, i.e., vacancies and interstitials. Clusters
of defects are generated when the incident particle, such as fast neutrons, transfers
enough energy to the recoil atoms for allowing large cascades of displacements. The
change observed in semiconductor conductivity is associated with the formation of
defect clusters. Section 4.2 gives a review of the processes of energy deposition and
related damage generation including radiation-induced defects. The effect of the
processes of energy deposition and induced damage on device parameters evolution
is reviewed, in that section, considering the dependence on the type of irradia-
tion particles, their energy and fluence of irradiation. The non-ionizing energy-loss
(NIEL) scaling hypothesis is formulated in that section.
The radiation-induced defects have a large impact on bulk properties of silicon
and can be investigated by the electrical behavior of semiconductor devices (for
instance, radiation detector, diodes and transistors) after irradiation. The degra-
dation rate of minority-carrier lifetimes can be expressed in terms of a damage
coefficient. The dependence of this coefficient on the type of substrate, dopant con-
centration, level of compensation, type, energy and fluence of the irradiating parti-
cles are discussed in Sect. 4.3. After irradiation with large fast-neutron fluences at
room temperature, centers with energy-levels near the mid-gap (near the intrinsic
Fermi level ) make a significant contribution to carrier generation and determine
i) the increase of the leakage current inside the depleted region of silicon devices
and ii) modifications to the diode structure and rectification properties. Low resis-
tivity p − n diodes may gradually change their internal structure with increasing
fast-neutron fluence. In fact, non-irradiated diodes with an ohmic (n
+
) contact can
acquire an almost p − i − n structure after irradiation. Section 4.3 reviews the ef-
fects of large radiation damages and the formation of p − i − n structure at room
temperature, as well as the dependence down to cryogenic temperatures of I − V
characteristics on the type and fluence of irradiating particles. The behavior of the
junction complex-impedance is additionally discussed down to cryogenic tempera-
tures. The Hall coefficient shows whether the charges are transported by positive
or negative carriers in extrinsic semiconductors and, except for the Hall factor or
scattering factor, is the reciprocal of the carrier density and electronic charge. The
Hall coefficient provides an indication of the type and concentration of dopants in a
sample and, when combined with the resistivity, it determines the carrier mobility
(Hall mobility). The Hall coefficient is not easily interpreted to determine the type
of majority carriers, in the case of materials partly compensated by impurities of
the opposite type. Hall coefficient and Hall mobility for various types of materials
are reviewed in Sect. 4.3 as functions of the particle fluence and the Frenkel-pairs for
irradiations with several types of particles. The case of large displacement damage
is also discussed. Finally, Section 4.3 concludes with a brief review of atomic force
microscopy (AFM) investigation in irradiated devices.
The basic knowledge, discussed in this chapter, finds applications in understand-