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Koster G., Rijnders G. (Eds.) In situ Characterization of Thin Film Growth
Woodhead Publishing, 2011, 282 pages

Recent advances in techniques to characterize thin films in-situ during deposition could lead to an improved understanding of deposition processes and to better, faster, diagnosis of issues with the deposition process. In-situ characterization of thin film growth will provide a comprehensive review of this increasingly important topic, focusing on the techniques and concepts.

Electron diffraction techniques for studying thin film growth in situ
Reflection high-energy electron diffraction (RHEED) for in situ characterization of thin film growth
Inelastic scattering techniques for in situ characterization of thin film growth: backscatter Kikuchi diffraction

Photoemission techniques for studying thin film growth in situ
Ultraviolet photoemission spectroscopy (UPS) for in situ characterization of thin film growth
X-ray photoelectron spectroscopy (XPS) for in situ characterization of thin film growth
In situ spectroscopic ellipsometry (SE) for characterization of thin film growth

Alteative in situ characterization techniques
In situ ion beam surface characterization of thin multicomponent films
Spectroscopies combined with reflection high-energy electron diffraction (RHEED) for real-time in situ surface monitoring of thin film growth
In situ deposition vapor monitoring
Real-time studies of epitaxial film growth using surface X-ray diffraction (SXRD)
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