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34R
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Tribology for Engineers
In the light-sectioning method, the image of a slit is thrown 
onto the surface at an incident angle of 45°. The refl ected 
image appears as a straight line if the surface is smooth and as 
an undulating line if the surface is rough. In the taper-sectioning 
method, a section is cut through the surface to be examined at 
an angle of θ, thus effectively magnifying the height variation 
by a factor of cot θ, and is subsequently examined by an 
optical microscope. The surface is supported with an adherent 
coating that prevents smearing of the contour during the 
sectioning process, while the taper section is lapped, polished 
and lightly heat tinted to provide good contrast for optical 
examination. This process suffers from disadvantages like 
destruction of test surface and tedious specimen preparation.
In the specular refl ection method, gloss or specular 
refl ectance that is a surface property of the material and a 
function of refl ective index and surface roughness, is measured 
by gloss meter. Surface roughness scatters the refl ected light 
and affects the specular refl ectance, thus a change in specular 
refl ectance provides a measure for surface roughness.
The diffuse refl ection method is particularly suitable for 
on-line roughness measurement during manufacture since it 
is continuous, fast, non-contacting and non-destructive. This 
method employs three varieties of approaches. In the total 
integrated scatter (TIS) approach, the total intensity of the 
diffusely scattered light is measured and used to generate the 
maps of asperities, defects and particles rather than micro-
roughness distribution. The diffuseness of the scattered light 
(DSL)  approach measures a parameter that characterizes 
the diffuseness of the scattered radiation pattern and relates 
this to surface roughness. In the angular distribution (AD) 
approach, the scattered light provides roughness height, 
average wavelength or average slope. With rougher surfaces, 
this may be useful as a comparator for monitoring both 
amplitude and wavelength surface properties.