the combined data for the A2B2 region are listed in Table 4.5. The diffu-
sion behavior of the transition metal atoms can be correlated with the pref-
erential solubility of these atoms on different sublattices.
[102]
Co and Ni,
which reveal preferential solubility on the a sublattice,
[103]
are slow dif-
fusers in Fe
3
Al, whereas Cr and Mn, which occupy mainly Al sites,
[103,104]
diffuse slightly faster than Fe.
4.5 Discussion of Lattice Diffusion in
Intermetallics
Section 4.4 analyzed self-diffusion in Ni, Ti, and Fe aluminides with
different structures. The systematic investigations demonstrate that the
antistructure-atom systems, that is, the systems with the antistructure-
defect type of disorder on both sides of the stoichiometry (Ni
3
Al, Ti
3
Al,
and TiAl), reveal only a weak compositional dependence of self-diffusivity.
In these systems, the effect of the compositional antistructure defects is
only marginal and is within experimental error. The analysis shows that
there are a number of reasons for such behavior: (1) The transition-metal
sublattice forms a connected network for intrasublattice nearest neighbor
jumps of atoms, which does not change the state of the order in the com-
pound [Fig. 4.2(a)–(d)]. (2) The vacancy concentration on the transition-
metal sublattice is larger by several orders of magnitude than that on the
Al sublattice [Fig. 4.3(a) and (b)]. (3) The sublattice diffusion mechanism
produces the dominant contribution in these compounds. Note that in
TiAl, the third argument is relevant only at temperatures below 1470 K,
where a linear Arrhenius dependence is observed [Fig. 4.11(a)].
Al diffusion in Ni
3
Al and Ti
3
Al, calculated from the interdiffusion
data, reveals a slight but clear increase of D
Al
with increasing Al content
on the Al-rich side of the compositions. This is related to the transition
metal sublattice diffusion mechanism for Al atoms and the appearance of
compositional Al antistructure atoms in addition to the thermal ones in
these compositions.
The most prominent compositional dependence of the activation enthalpy
Q of self-diffusion in Ni and Ti aluminides is observed in the phase NiAl
exhibiting triple defects. The most remarkable change in Q, however, occurs
on the Ni-rich side in NiAl, while the formation of the Ni structural vacancies
does not practically affect Q [see Fig. 4.14(b)]. The latter behavior is
explained by the triple-defect diffusion mechanism producing a dominant
contribution in the Al-rich, stoichiometric, and slightly Ni-rich compositions
of NiAl. The distinct decrease of Qat larger Ni content (above 54 at.% Ni) is
explained by an additional contribution of the ASB mechanism, which oper-
ates in NiAl with the percolation threshold at about 55 at.% Ni.
DIFFUSION IN INTERMETALLIC COMPOUNDS, HERZIG, DIVINSKI 221