
58 Part 1 Semiconductor Devices and Basic Applications
1.4 (a) Find the concentration of electrons and holes in a sample of germanium
that has a concentration of donor atoms equal to
10
15
cm
−3
.
Is the semicon-
ductor n-type or p-type? (b) Repeat part (a) for silicon.
1.5 Gallium arsenide is doped with acceptor impurity atoms at a concentration
of
10
16
cm
−3
.
(a) Find the concentration of electrons and holes. Is the semi-
conductor n-type or p-type? (b) Repeat part (a) for germanium.
1.6 Silicon is doped with
5 × 10
16
arsenic atoms/cm
3
. (a) Is the material n- or
p-type? (b) Calculate the electron and hole concentrations at
T = 300 K
.
(c) Repeat part (b) for
T = 350 K
.
1.7 (a) Calculate the concentration of electrons and holes in silicon that has a
concentration of acceptor atoms equal to
5 × 10
16
cm
−3
.
Is the semicon-
ductor n-type or p-type? (b) Repeat part (a) for GaAs.
1.8 A silicon sample is fabricated such that the hole concentration is
p
o
= 2 ×10
17
cm
−3
.
(a) Should boron or arsenic atoms be added to the
intrinsic silicon? (b) What concentration of impurity atoms must be added?
(c) What is the concentration of electrons?
1.9 The electron concentration in silicon at
T = 300 K
is
n
o
= 5 ×10
15
cm
−3
.
(a) Determine the hole concentration. (b) Is the material n-type or p-type?
(c) What is the impurity doping concentration?
1.10 (a) A silicon semiconductor material is to be designed such that the major-
ity carrier electron concentration is
n
o
= 7 ×10
15
cm
−3
. Should donor or
acceptor impurity atoms be added to intrinsic silicon to achieve this electron
concentration? What concentration of dopant impurity atoms is required?
(b) In this silicon material, the minority carrier hole concentration is to
be no larger than
p
o
= 10
6
cm
−3
. Determine the maximum allowable
temperature.
1.11 (a) The applied electric field in p-type silicon is
E = 10 V/cm.
The semi-
conductor conductivity is
σ = 1.5 (–cm)
−1
and the cross-sectional area is
A = 10
−5
cm
2
.
Determine the drift current. (b) The cross-sectional area of
a semiconductor is
A = 2 ×10
−4
cm
2
and the resistivity is
ρ = 0.4
(–cm).
If the drift current is
I = 1.2mA,
what applied electric field must
be applied?
1.12 A drift current density of 120 A/cm
2
is established in n-type silicon with an
applied electric field of 18 V/cm. If the electron and hole mobilities are
μ
n
= 1250 cm
2
/V–s
and
μ
p
= 450 cm
2
/V–s,
respectively, determine the
required doping concentration.
1.13 An n-type silicon material has a resistivity of
ρ = 0.65 –cm.
(a) If the
electron mobility is
μ
n
= 1250 cm
2
/V–s,
what is the concentration of
donor atoms? (b) Determine the required electric field to establish a drift
current density of
J = 160 A/cm
2
.
1.14 (a) The required conductivity of a silicon material must be
σ = 1.5 (–cm)
−1
.
If
μ
n
= 1000 cm
2
/V–s
and
μ
p
= 375 cm
2
/V–s,
what
concentration of donor atoms must be added? (b) The required conductivity
of a silicon material must be
σ = 0.8 (–cm)
−1
.
If
μ
n
= 1200 cm
2
/V–s
and
μ
p
= 400 cm
2
/V–s,
what concentration of acceptor atoms must be
added?
1.15 In GaAs, the mobilities are
μ
n
= 8500 cm
2
/V–s
and
μ
p
= 400 cm
2
/
V–s.
(a) Determine the range in conductivity for a range in donor concentration
of
10
15
≤ N
d
≤ 10
19
cm
−3
. (b) Using the results of part (a), determine the
range in drift current density if the applied electric field is
E = 0.10 V/cm
.
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