Surfaces 45
1.2.5.2. X-ray photoelectron spectroscopy
–
Primary particle: photon.
–
Secondary particle:electron.
–
Acronym: ESCA, XPS.
–
Characteristics of the technique:
- elemental analysis of materials,
- information about the environment of the atoms identified and the nature of
chemical bonds, and
- analysis of a surface of a few mm
2
to a depth of 0.1–2 nm.
P
OSSIBLE APPLICATIONS Analysis of oxide films and corrosion layers in order to
determine the nature of chemical bonds of the main elements as well as that of
impurities; analysis of passivation layers; characterization of the state of chemical
bonds within polymers; and analysis of the core level and valence band.
1.2.5.3. Auger electron spectroscopy
–
Primary particle: electron.
–
Secondary particle: electron.
–
Acronym: AES.
–
Characteristics of the technique:
- elemental analysis of the top few-atom layers of solids. The depth of analysis
is 2 to 3 monolayers (of the order of a nanometer),
- local analysis (primary electron beam diameter less than 10 nm); the use of
an ion beam allows in-depth analysis alternating between analysis and ionic erosion
(down to several microns). This is also made possible by photoelectron spectroscopy
(XPS).
P
OSSIBLE APPLICATIONS Analysis of adsorbed layers. Analysis of thermal or
anodic oxide films. Characterization of thin deposits and analysis of segregated
layers on surfaces or within grain boundaries.
1.2.5.4. Glow discharge optical emission spectroscopy
–
Primary particle: ion.
–
Secondary particle: photon.