Yao N. Focused Ion Beam Systems: Basics and Applications

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FOCUSED ION BEAM SYSTEMS

Basics and Applications

The focused ion beam (FIB) system is an important tool for understanding and

manipulating the structure of materials at the nanoscale. Combining this system with an

electron beam creates a TwoBeam system – a single system that can function as an

imaging, analytical, and sample modiﬁcation tool. Presenting the principles, capabilities,

challenges, and applications of the FIB technique, this edited volume comprehensively

covers the state-of-the-art in ion beam technology including the TwoBeam system.

The basic principles of ion beam and two-beam systems, their interaction with

materials, etching, and deposition are all covered, as well as in-situ materials

characterization, sample preparation, three-dimension reconstruction, and applications

in biomaterials and nanotechnology.

With nanostructured materials becoming increasingly important in micromechani-

cal, electronic, and magnetic devices, this self-contained working knowledge of the full

range of ion beam methods, their advantages, and when best to implement them is a

valuable resource for researchers in materials science, electrical engineering, and

nanotechnology.

For color versions of selected ﬁgures, please go to the resources link at www.

cambridge.org/9780521831994.

Nan Yao holds several positions at Princeton University, New Jersey. He is director of

the Imaging and Analysis Center, Senior Research Scholar at the Institute for the

Science and Technology of Materials, and a senior lecturer in Materials Science and

Engineering.

FOCUSED ION BEAM SYSTEMS

Basics and Applications

Edited by

NAN YAO

Princeton University, New Jersey

cambridge university press

Cambridge, New York, Melbourne, Madrid, Cape Town, Singapore, Sa

o Paulo

Cambridge University Press

The Edinburgh Building, Cambridge CB2 8RU, UK

Published in the United States of America by Cambridge University Press, New York

www.cambridge.org

Information on this title: www.cambridge.org/9780521831994

ª Cambridge University Press 2007

This publication is in copyright. Subject to statutory exception

and to the provisions of relevant collective licensing agreements,

no reproduction of any part may take place without

the written permission of Cambridge University Press.

First published 2007

Printed in the United Kingdom at the University Press, Cambridge

A catalogue record for this publication is available from the British Library

ISBN 978-0-521-83199-4 hardback

Cambridge University Press has no responsibility for the persistence or

accuracy of URLs for external or third-party internet websites referred to

in this publication, and does not guarantee that any content on such

websites is, or will remain, accurate or appropriate.

Contents

List of contributors page vii

Preface xi

1 Introduction to the focused ion beam system 1

Nan Yao

2 Interaction of ions with matter 31

Nobutsugu Imanishi

3 Gas assisted ion beam etching and deposition 67

Hyoung Ho (Chris) Kang, Clive Chandler, and Matthew Weschler

4 Imaging using electrons and ion beams 87

Kaoru Ohya and Tohru Ishitani

5 Characterization methods using FIB/SEM DualBeam

instrumentation 126

Steve Reyntjens and Lucille A. Giannuzzi

6 High-density FIB-SEM 3D nanotomography: with applications

of real-time imaging during FIB milling 146

E. L. Principe

7 Fabrication of nanoscale structures using ion beams 187

Ampere A. Tseng

8 Preparation for physico-chemical analysis 215

Richard Langford

9 In-situ sample manipulation and imaging 250

T. Kamino, T. Yaguchi, T. Ohnishi and T. Ishitani

10 Micro-machining and mask repair 268

Mark Utlaut

11 Three-dimensional visualization of nanostructured materials

using focused ion beam tomography 295

Derren Dunn, Alan J. Kubis, and Robert Hull

12 Ion beam implantation of surface layers 318

Daniel Recht and Nan Yao

13 Applications for biological materials 337

Kirk Hou and Nan Yao

14 Focused ion beam systems as a multifunctional tool for

nanotechnology 355

Toshiaki Fujii, Tatsuya Asahata, and Takashi Kaito

Index 391

vi Contents

Contributors

Tatsuya Asahata

SII Nano Technology Inc., Japan

Clive Chandler

FEI Company, 5350 NE Dawson Creek Drive, Hillsboro, OR 97124-5793

Derren Dunn

IBM Microelectronics, Hopewell Junction, NY 12533

Toshiaki Fujii

SII NanoTechnology Inc., Japan

Lucille A. Giannuzzi

FEI Company, 5350 NE Dawson Creek Drive, Hillsboro, OR 97124-5793

Hyoung Ho (Chris) Kang

IBM Microelectronics, East Fishkill, New York, NY

Kirk Hou

Princeton University, Princeton Institute for the Science and Technology of

Materials, 70 Prospect Avenue, Princeton, NJ 08540

Robert Hull

University of Virginia, Department of Materials Science and Engineering,

116 Engineers Way, Charlottesville, VA 22904-4745

Nobutsugu Imanishi

Kyoto University, Department of Nuclear Engineering, 3-1-14 Ayameike-

minami, Nara, 631-0033, Japan

Tohru Ishitani

Naka division, Hitachi High-technologies Corporation, Ichige 882, Hitachi-

naka, Ibaraki, 312-8504, Japan

vii

Takashi Kaito

SII NanoTechnology Inc., Japan

T. Kamino

Hitachi Science Systems, Ltd., 11-1 Ishikawa-cho, Hitachinaka-shi, Ibaraki-

ken, 312-0057, Japan

Alan J. Kubis

University of Virginia, Department of Materials Science, 116 Engineers Way,

Charlottesville, VA 22904

Richard Langford

University of Manchester, Materials Science Centre, School of Materials,

Grosvenor Street, Manchester M1 7HS, UK

T. Ohnishi

Hitachi High-technologies Corporation, 882, Ichige, Hitachinaka-shi,

Ibaraki-ken, 312-8504, Japan

Kaoru Ohya

The University of Tokushima, Department of Electrical and Electronic

Engineering, Faculty of Engineering, Minamijosanjima 2-1, Tokushima,

770-8506, Japan

E. L. Principe

Carl Zeiss SMT Inc., Nano Technology Systems Division, 555 Twin Dolphin

Drive, Redwood City, CA 94065

Daniel Recht

Princeton University, Princeton Institute for the Science and Technology of

Materials, 70 Prospect Avenue, Princeton, NJ 08540

Steve Reyntjens

FEI Company, Achtseweg Noord 5, 5651 GG Eindhoven, The Netherlands

Ampere A. Tseng

Arizona State University, Department of Mechanical and Aerospace

Engineering, Tempe, Arizona 85287-6106

Mark Utlaut

University of Portland, Department of Physics, Portland, OR 97203

Matthew Weschler

FEI Company, 5350 NE Dawson Creek Drive, Hillsboro, OR 97124-5793

viii List of contributors

T. Yaguchi

Hitachi Science Systems, Ltd., 11-1 Ishikawa-cho, Hitachinaka-shi, Ibaraki-

ken, 312-0057 Japan

Nan Yao

Princeton University, Princeton Institute for the Science and Technology of

Materials, 70 Prospect Avenue, Princeton, NJ 08540

List of contributors